Applications

• Surface analysis
• Liquid crystal displays

Functionalities

Type 1,2,3 models

• 1200x720mm stage travel is more than adequate to handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large work-pieces; 150mm Z-axis stroke; bright diascopic illumination
• 3 models (type: 1, 2, 3) with 5-step zoom magnification to cover different fields of view and resolution requirements
• Laser AF also enables measurements of height variance and warping in workpieces
• Search function facilitates measurements of lands and holes of PCBs
• Variety of illumination choices facilitate accurate edge detection even for vague geometries
• High-speed stage and high-speed image processing provide high throughput

• Achieves ultra-high magnification measurements with a long 1200x720mm stage stroke. Ideal for measuring minute line widths of large-size display panels.
• Automatic measurements of batches of small parts
• Laser AF achieves high-accuracy measurements of bump heights Laser AF enables measurements of height variance and warping in workpieces
• Search function enables measurements of lands and holes of PCBs
• Search function also provides accurate measurements even when workpieces are not located properly on the stage
• Variety of illumination choices facilitate accurate edge detection even for weak edges
• High-speed stage and image processing provide higher throughput
• Ideal for LCD glass substrates (pattern measurements) and organic EL glass substrates (pattern measurements)

• Full range of Nikon CFI60 LU microscope objectives from 5X to 150X
• Supports brightfield, darkfield, DIC, simple polarizing applications
• Motorized quintuple universal nosepiece
• Easy to use software controls all functions of the system